Stress Effects in Boron‐Implanted Polysilicon Films

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© 1984 ECS - The Electrochemical Society
, , Citation Min S. Choi and Eric W. Hearn 1984 J. Electrochem. Soc. 131 2443 DOI 10.1149/1.2115314

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1 IBM Corporation, General Technology Division, East Fishkill Facility, Hopewell Junction, New York 12533

Dates

  1. Received 7 March 1984
  2. Revised 7 May 1984

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