Preparation of Atomically Smooth TiO2 Single Crystal Surfaces and Their Photochemical Property

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Published 8 April 2005 • Copyright (c) 2005 The Japan Society of Applied Physics
, , Citation Yuichi Yamamoto et al 2005 Jpn. J. Appl. Phys. 44 L511 DOI 10.1143/JJAP.44.L511

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1 Materials and Structures Laboratory, Tokyo Institue of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

2 Research Center, Asahi Glass Co. Ltd., 1150 Hazawa, Kanagawa-ku, Yokohama 221-8755, Japan

3 Frontier Collaborative Research Center, Tokyo Institue of Technology, 4259 Nagatsuta, Midori-ku, Yokohama 226-8503, Japan

4 CREST-Japan Science and Technology corporation, 3-4-1 Nihonbashi, Tyu-o-ku, Tokyo 103-0027, Japan

Dates

  1. Received 22 February 2005
  2. Accepted 23 March 2005
  3. Published

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Abstract

Atomically smooth rutile TiO2(110), (100), (001), (111) and (101) surfaces were obtained for the first time by an appropriate cleaning and subsequent thermal treatment of commercially available single crystals. The annealing temperature for obtaining the ultra-smooth surface varied between 400 and 900°C depending on the crystallographic planes. The key point to the successful preparation of the regularly stepped TiO2 surface was an HF treatment for the removal of surface impurities. By using these well-defined TiO2 surfaces, the photochemical property was found to depend on the surface orientation; the photo-reduction of Ag+ to Ag metal from an aqueous solution proceeded in the order of (101) > (100) > (001) > (111) > (110) on the TiO2 surfaces.

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10.1143/JJAP.44.L511