Abstract
The spin coating property for the reduction of the photoresist consumption was investigated experimentally using photoresist samples systematically. Dry film thickness D is affected by spin velocity ω: D=kω-1/2, where k is a constant. The photoresist samples can be characterized by a constant k irrespective of their composition. The same k photoresist results in the same consumption when the prespin velocity is optimized for reducing the consumption. The consumption is reduced as k becomes smaller. In the case where the prespin velocity is fixed, the consumption becomes smaller for the sample for which the solvent viscosity is small and the solvent evaporation rate is large.