Light Emission from Nanometer-Sized Silicon Particles Fabricated by the Laser Ablation Method

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Copyright (c) 1996 The Japan Society of Applied Physics
, , Citation Tetsuya Makimura Tetsuya Makimura et al 1996 Jpn. J. Appl. Phys. 35 4780 DOI 10.1143/JJAP.35.4780

1347-4065/35/9R/4780

Abstract

Luminescent nanometer-sized silicon particles are fabricated by laser ablation of a silicon target in helium gas. The formation of products is found to be governed by the dynamics of the laser-ablated silicon particles in the gas. The products deposited on silicon substrates exhibit light emission with a peak at 1.6 eV in the air, while 2.1 eV after annealing for 20 min at 800°C in oxygen gas. Applying the laser ablation technique, we demonstrate a novel technique for fabricating silicon particles embedded in a silicon dioxide film. The particles also exhibit visible light emission.

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10.1143/JJAP.35.4780