Brought to you by:

Development and Applications of a Compact Electron Cyclotron Resonance Source

, , , and

Copyright (c) 1991 The Japan Society of Applied Physics
, , Citation Patrick O'keeffe et al 1991 Jpn. J. Appl. Phys. 30 3164 DOI 10.1143/JJAP.30.3164

1347-4065/30/11S/3164

Abstract

A new compact ECR plasma source has been developed. The characteristics of this source and it's applications are discussed. Irradiation by oxygen radicals O* for the oxidation during deposition process was found to produce high quality superconducting thin films with increased characteristic temperatures. Hydrogen radical H* beam cleaning of GaAs substrate surfaces was achieved at temperatures as low as 100°C.

Export citation and abstract BibTeX RIS

Please wait… references are loading.
10.1143/JJAP.30.3164