Abstract
A new selective deposition technology by electron beam induced surface reaction has been demonstrated. Cr line patterns were deposited using Cr(C6H6)2 as a source. Cr deposition was confirmed by analysis using XMA and AES. The deposited thickness is proportional to electron beam dose. A 0.15 µm linewidth Cr pattern was deposited at 5×10-7 C/cm. This technology will be important for nanometer structure fabrication and new structure devices.