Determination of Plasma Gas Temperature during Reactive Sputter Etching
Masaharu Oshima1
Copyright (c) 1978 The Japan Society of Applied Physics
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Citation Masaharu Oshima 1978 Jpn. J. Appl. Phys. 17 1157
DOI 10.1143/JJAP.17.1157
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1347-4065/17/6/1157