Reflective Microoptical Element Array Fabricated by Photofabrication Technique

, , and

Published 25 August 2004 Copyright (c) 2004 The Japan Society of Applied Physics
, , Citation Yasuhiro Awatsuji et al 2004 Jpn. J. Appl. Phys. 43 5845 DOI 10.1143/JJAP.43.5845

1347-4065/43/8S/5845

Abstract

The authors present reflective microoptical element arrays fabricated by a photofabrication technique. The three-dimensional base of the microoptical element array is photofabricated by exposing photopolymerizable resin to a light beam through a grayscale mask. Reflective film on the photopolymerized base of the optical element is introduced to prevent serious problems in photofabricated refractive optical elements, such as when the optical characteristics of the elements fundamentally depends on the spectroscopic property of the material of the photofabricated optical element. The relationship between the pixel value in the grayscale bitmap image used for making the grayscale transparency mask and the cure depth of the photofabricated base is experimentally clarified for a photopolymerizable resin. 15×15 unit convex and concave micromirror arrays, in which each optical element has a diameter of 930 µm, have been batch fabricated. The focusing capability of the fabricated concave micromirror array is demonstrated.

Export citation and abstract BibTeX RIS

10.1143/JJAP.43.5845