Growth of Bulk GaN with Low Dislocation Density by the Ammonothermal Method Using Polycrystalline GaN Nutrient

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Published 1 June 2007 Copyright (c) 2007 The Japan Society of Applied Physics
, , Citation Tadao Hashimoto et al 2007 Jpn. J. Appl. Phys. 46 L525 DOI 10.1143/JJAP.46.L525

1347-4065/46/6L/L525

Abstract

A bulk GaN crystal with improved structural quality was grown via ammonthermal growth with polycrystalline GaN nutrient and a sodium amide mineralizer. The threading dislocation density estimated by plan-view transmission electron microscopy observations was less than 1×106 cm-2 for the Ga-face and 1×107 cm-2 for the N-face. There was no dislocation generation observed at the interface on the Ga-face although a few defects were generated at the interface on the N-face. The chemical etching revealed macroscopic grains on the N-face.

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