Comparative Study of ZnSe Growth Rate by Metal Organic Molecular Beam Epitaxy Using Different Zn Sources

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Copyright (c) 1988 The Japan Society of Applied Physics
, , Citation Naoki Kobayashi et al 1988 Jpn. J. Appl. Phys. 27 L1728 DOI 10.1143/JJAP.27.L1728

1347-4065/27/9A/L1728

Abstract

The substrate temperature dependence of ZnSe growth rate is investigated using dimethyl zinc and diethyl zinc as Zn sources in metalorganic molecular beam epitaxy under the same flux intensity conditions. The growth rate for dimethyl zinc is higher at substrate temperatures above 450°C, and more sensitive to changes in substrate temperature than the growth rate for diethyl zinc. The mechanism resulting in the growth rate difference observed in this study is discussed in relation to the desorption process preceding ZnSe congruent evaporation.

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10.1143/JJAP.27.L1728