Abstract
We report light-controlled selective Pb deposition on a photochromic surface. Pb evaporation onto the photochromic surface with isomerization patterns at room temperature (24 °C) generated no selective deposition; however a slight increase of the substrate temperature around 10–15 °C enabled the perfect selective Pb deposition, that is, Pb was deposited on the colored surface but not on the uncolored surface. A preparation of thin-film microfuse (µ-fuse) based on selective Pb deposition was demonstrated using laser scanning and maskless Pb evaporation. The µ-fuse showed a highly sensitive interrupt current level.