Skip to main content
SpringerLink
Log in

PIC simulations of capacitively coupled oxygen rf discharges

  • Regular Article
  • Published:
The European Physical Journal D Aims and scope Submit manuscript

Abstract

Capacitively coupled discharges with a radio-frequency operated voltage (ccrf) are important for plasma assisted material processing. Experiments with electronegative oxygen ccrf discharges show a high-energy peak in the energy distribution of negative ions arriving at the anode, depending on the cathode material used. One possible explanation is ionization at or close to the surface of the cathode for the production of negative ions. By introducing an additional surface ionization model into a Particle-In-Cell (PIC) simulation with Monte Carlo Collisions (MCC) the experimental result is reproduced qualitatively. Comparison of one dimensional and two dimensional simulation results allows an improved understanding of the microscopic processes determining the dynamics of negative ions.

Graphical abstract

This is a preview of subscription content, log in via an institution to check access.

Access this article

Log in via an institution

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Institutional subscriptions

Similar content being viewed by others

References

  1. U. Cvelbar, M. Mozetic, M. Klansjek-Gunde, IEEE Trans. Plasma Sci. 33, 236 (2005)

    Article  ADS  Google Scholar 

  2. M. Zeuner, H. Neumann, J. Zalman, H. Bidermann, J. Appl. Phys. 83, 5083 (1998)

    Article  ADS  Google Scholar 

  3. J.T. Gudmundsson, B. Ventéjou, J. Appl. Phys. 118, 153302 (2015)

    Article  ADS  Google Scholar 

  4. E. Stoffels, W.W. Stoffels, G.M.W. Kroesen, Plasma Sources Sci. Technol. 10, 311 (2001)

    Article  ADS  Google Scholar 

  5. H. Kawano, F.M. Page, Int. J. Mass Spectrom. Ion Phys. 50, 1 (1983)

  6. I. Korolov, A. Derzsi, Z. Donkó, E. Schlüngel, J. Schulze, Plasma Sources Sci. Technol. 25, 015024 (2016)

    Article  ADS  Google Scholar 

  7. J. Meichsner, M. Schmidt, R. Schneider, H.-E. Wagner, Nonthermal plasma chemistry and physics (CRC Press, Boca Raton, Florida, 2013)

  8. D. Tskhakaya, K. Matyash, R. Schneider, F. Taccogna, Contrib. Plasma Phys. 47, 563 (2007)

    Article  ADS  Google Scholar 

  9. J.T. Gudmundsson, E. Kawamura, M.A. Lieberman, Plasma Sources Sci. Technol. 22, 035011 (2013)

    Article  ADS  Google Scholar 

  10. K. Matyash, R. Schneider, F. Taccogna, A. Hatayama, S. Longo, M. Capitelli, D. Tskhakaya, F.X. Bronold, Contrib. Plasma Phys. 47, 595 (2007)

    Article  ADS  Google Scholar 

  11. F.X. Bronold, K. Matyash, D. Tskhakaya, R. Schneider, H. Fehske, J. Phys. D: Appl. Phys. 40, 6583 (2007)

    Article  ADS  Google Scholar 

  12. C. Küllig, J. Meichsner, K. Dittmann, Phys. Plasma 19, 73 (2012)

    Article  Google Scholar 

  13. Z. Donkó, J. Schulze, B.G. Heil, U. Czarnetzki, J. Phys. D:Appl. Phys. 42, 25205 (2008)

    Article  Google Scholar 

  14. E. Schüngel, I. Korolov, B. Bruneau, A. Derzsi, E. Johnson, D. OConnell, T. Gans, J.-P. Booth, Z. Donkó, J. Schulze, J. Phys. D: Appl. Phys. 49, 265203 (2016)

    Article  ADS  Google Scholar 

  15. A. Derzsi, T. Lafleur, J.-P. Booth, I. Korolov, Z. Donkó, Plasma Sources Sci. Technol. 25, 015004 (2016)

    Article  ADS  Google Scholar 

  16. M.A. Liebermann, A.J. Lichtenberg, Principles of plasma discharges and materials processing (John Wiley &Sons Inc., Hoboken, New Jersey, 1994)

Download references

Author information

Authors and Affiliations

  1. Institute of Physics, Ernst-Moritz-Arndt-University Greifswald, 17489, Greifswald, Germany

    Paul Matthias, Gunnar Bandelow, Konstantin Matyash, Philipp Hacker, Daniel Kahnfeld, Lars Lewerentz, Karl F. Lüskow, Jürgen Meichsner & Ralf Schneider

  2. Nuremberg Institute of Technology, 90489, Nuremberg, Germany

    Julia Duras

  3. Institute of Computer Science and Technology, University Rostock, 18051, Rostock, Germany

    Stefan Kemnitz

Authors
  1. Paul Matthias
    View author publications

    You can also search for this author in PubMed Google Scholar

  2. Gunnar Bandelow
    View author publications

    You can also search for this author in PubMed Google Scholar

  3. Konstantin Matyash
    View author publications

    You can also search for this author in PubMed Google Scholar

  4. Julia Duras
    View author publications

    You can also search for this author in PubMed Google Scholar

  5. Philipp Hacker
    View author publications

    You can also search for this author in PubMed Google Scholar

  6. Daniel Kahnfeld
    View author publications

    You can also search for this author in PubMed Google Scholar

  7. Stefan Kemnitz
    View author publications

    You can also search for this author in PubMed Google Scholar

  8. Lars Lewerentz
    View author publications

    You can also search for this author in PubMed Google Scholar

  9. Karl F. Lüskow
    View author publications

    You can also search for this author in PubMed Google Scholar

  10. Jürgen Meichsner
    View author publications

    You can also search for this author in PubMed Google Scholar

  11. Ralf Schneider
    View author publications

    You can also search for this author in PubMed Google Scholar

Corresponding author

Correspondence to Paul Matthias.

Additional information

Contribution to the Topical Issue “Fundamentals of Complex Plasmas”, edited by Jürgen Meichsner, Michael Bonitz, Holger Fehske, Alexander Piel.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Matthias, P., Bandelow, G., Matyash, K. et al. PIC simulations of capacitively coupled oxygen rf discharges. Eur. Phys. J. D 72, 86 (2018). https://doi.org/10.1140/epjd/e2017-80565-y

Download citation

  • Received:

  • Revised:

  • Published:

  • DOI: https://doi.org/10.1140/epjd/e2017-80565-y

Search

Navigation