Abstract.
Four series of Ni51.4Mn28.3Ga20.3/substrate thin film composites, where the substrate is either Si(100), MgO(100), alumina or Mo foil, and two series of Ni53.5Mn23.8Ga22.7/substrate composites where the substrate is either alumina or Mo foil, with different film thicknesses varying from 0.1 to 5 μm have been studied in the cubic phase by XRD stress measurements. The values of residual stresses are found to be dependent on both substrate and film thickness. In the submicron range, a correlation between thickness dependencies of residual stress and transformation temperatures is experimentally obtained. The temperature dependence of the d-spacing d220 is studied for the films deposited on Si(100).
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
M. Wuttig, C. Craciunescu, J. Li, Mater. Trans. JIM 41, 933 (2000)
H. Rumpf, J. Feydt, D. Levandovski, A. Ludwig, B. Winzek, E. Quandt, P. Zhao, M. Wuttig, Proc. SPIE 5053, 191 (2003)
J.W. Dong, Q.J. Xie, J. Lu, C. Adelmann, C.J. Palmstrøm, J. Cui, Q. Pan, T.W. Shield, R.D. James, S. McKernan, J. Appl. Phys. 95, 2593 (2004)
J. Dubowik, Y.V. Kudryavtsev, Y.P. Lee, J. Appl. Phys. 95, 2912 (2004)
V.A. Chernenko, M. Ohtsuka, M. Kohl, V.V. Khovailo, T. Takagi, Smart Mater. Struct. 14, S245 (2005)
V.A. Chernenko, R. Lopez Anton, M. Kohl, M. Otsuka, I. Orue, J.M. Barandiaran, J. Phys. Condens. Matter 17, 5215 (2005)
M. Kohl, V.A. Chernenko, M. Ohtsuka, H. Reuter, T. Takagi, Mater. Res. Soc. Symp. Proc. 855E, W2.8.1 (2005)
V.A. Chernenko, M. Kohl, V.A. L'vov, V.M. Kniazkyi, M. Ohtsuka, O. Kraft, Mater. Trans. 47, 619 (2006)
V.A. Chernenko, M. Kohl, S. Doyle, P. Müllner, M. Ohtsuka, Scr. Mater. 54, 1287 (2006)
M. Kohl, A. Agarwal, V.A. Chernenko, M. Ohtsuka, K. Seemann, Mater. Sci. Eng. A 438-440, 940 (2006)
V.A. Chernenko, S. Doyle, M. Kohl, P. Müllner, S. Besseghini, M. Ohtsuka, Z. Kristall (2007) (in print)
S. Besseghini, A. Gambardella, V.A. Chernenko, M. Hagler, C. Pohl, P. Müllner, M. Ohtsuka, S. Doyle, Eur. Phys. J. Special Topics 158, 179 (2008)
V.A. Chernenko, S. Besseghini, M. Hagler, P. Müllner, M. Ohtsuka, F. Stortiero, Mater. Sci. Eng. A (2007) [doi:10.1016/j.msea.2006.12.206]
A.L. Roytburd, T.S. Kim, Q. Su, J. Slutsker, M. Wuttig, Acta Mater. 46, 5095 (1998)
H.T. Hesemann, P. Müllner, O. Kraft, E. Arzt, J. Phys. (France) 112, 107 (2003)
O. Kraft, H. Hommel, E. Arzt, Mater. Sci. Eng. A 288, 209 (2000)
I.C. Noyan, L.B. Cohen, Residual Stress: Measurement by Diffraction and Interpretation (Springer-Verlag, New York, 1987)
P.S. Previy, Developments in Materials Characterization Technologies, edited by G. Vander Voort, J. Friel (ASM International, Materials Park, Ohio, 1996), p. 103
M. Hagler, V.A. Chernenko, M. Ohtsuka, S. Besseghini, P. Müllner, MRS Spring Meeting, Symposium J (to be published in electronic format)
W.D. Nix, Met. Trans. A 20, 2217 (1989)
W.D. Nix, Scr. Mater. 39, 545 (1998)
R.-M. Keller, S.P. Baker, E. Arzt, J. Mater. Res. 13, 1307 (1998)
B. von Blanckenhagen, E. Arzt, P. Gumbsch, Acta Mater. 52, 773 (2004)
M. Wuttig, Y. Zheng, J.S. Slutsker, K. Mori, Q. Su, Scr. Mater. 41, 529 (1999)
Author information
Authors and Affiliations
Rights and permissions
About this article
Cite this article
Doyle, S., Chernenko, V., Besseghini, S. et al. Residual stress in Ni-Mn-Ga thin films deposited on different substrates. Eur. Phys. J. Spec. Top. 158, 99–105 (2008). https://doi.org/10.1140/epjst/e2008-00660-8
Issue Date:
DOI: https://doi.org/10.1140/epjst/e2008-00660-8