Abstract
The electrical and optical properties of epitaxial CdHgTe films grown on silicon substrates by molecular-beam epitaxy have been studied. The results of photoluminescence measurements are indicative of the high structural perfection of the films, and Hall data combined with low-energy ion treatment point to a low concentration of residual donors (∼5 × 1014 cm−3). Acceptor states supposedly related to the capture of impurities at structural defects typical of strongly lattice-mismatched heteroepitaxial structures are found in the films.
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Original Russian Text © I.I. Izhnin, K.D. Mynbaev, M.V. Yakushev, A.I. Izhnin, E.I. Fitsych, N.L. Bazhenov, A.V. Shilyaev, H.V. Savitskyy, R. Jakiela, A.V. Sorochkin, V.S. Varavin, S.A. Dvoretsky, 2012, published in Fizika i Tekhnika Poluprovodnikov, 2012, Vol. 46, No. 10, pp. 1363–1367.
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Izhnin, I.I., Mynbaev, K.D., Yakushev, M.V. et al. Electrical and optical properties of CdHgTe films grown by molecular-beam epitaxy on silicon substrates. Semiconductors 46, 1341–1345 (2012). https://doi.org/10.1134/S1063782612100065
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DOI: https://doi.org/10.1134/S1063782612100065