Abstract
The effect of the working gas pressure (P ≈ 1.33–0.09 Pa) and the substrate temperature (T s ≈ 77–550 K) on the texture and the microstructure of nickel films deposited by magnetron sputtering onto SiO2/Si substrates is studied. Ni(200) films with a transition type of microstructure are shown to form at growth parameters P ≈ 0.13–0.09 Pa and T s ≈ 300–550 K, which ensure a high migration ability of nickel adatoms on a substrate. This transition type is characterized by a change of the film structure from quasi-homogeneous to quasi-columnar when a film reaches a critical thickness. Ni(111) films with a columnar microstructure and high porosity form at a low migration ability, which takes place at P ≈ 1.33–0.3 Pa or upon cooling a substrate to T s ≈ 77 K.
This is a preview of subscription content, log in via an institution to check access.
Similar content being viewed by others
References
Y. Pauleau, S. Kukielka, W. Gulbinski, et al., J. Phys. D: Appl. Phys. 39, 2803 (2006).
L. G. Pratibha, R. Mitra, and J. R. Weertman, Pure Appl. Chem. 74, 1519 (2002).
H. Shimizu, E. Suzuki, and Y. Hoshi, Electrochim. Acta 44, 3933 (1999).
S. Hameed, P. Talagala, and R. Naik, J. Magn. Magn. Mater. 242—245, 1264 (2002).
J. B. Yi, Y. Z. Zhou, and Z. J. Ding, J. Magn. Magn. Mater. 284, 303 (2004).
P. B. Geetha, S. Aich, and M. Chakraborty, J. Mater. Sci. 46, 2860 (2011).
O. Kohmoto, N. Mineji, and Y. Isagawa, J. Magn. Magn. Mater. 239, 36 (2002).
V. V. Naumov, V. F. Bochkarev, O. S. Trushin, et al., Tech. Phys. 46, 1020 (2001).
C. Nacereddine, A. Layadi, A. Guittoum, et al., Mater. Sci. Eng., B 136, 197 (2007).
F. Czerwinski and J. A. Szpunar, Textures Microstruct. 34, 197 (2000).
A. Y. Pavlova, Y. V. Nikulin, A. S. Dzhumaliev, et al., Appl. Surf. Sci. 347, 435 (2015).
K. Takahashi, Y. Kazuki, H. Kato, H. Hibino, et al., Surf. Sci. 606, 728 (2012).
A. S. Dzhumaliev, Yu. V. Nikulin, and Yu. A. Filimonov, Tech. Phys. 59, 1097 (2014).
J. Koike, M. Wada, M. Sanada, et al., Appl. Phys. Lett. 81, 1017 (2002).
W. Pan, Y.-T. Shih, K. L. Lee, et al., J. Appl. Phys. 111, 07C113-3 (2012).
E. C. Corredor, J. L. Diez-Ferrer, D. Coey, et al., J. Phys. 200, 072019-4 (2010).
A. S. Dzhumaliev, Yu. V. Nikulin, and Yu. A. Filimonov, J. Commun. Technol. Electron. 57, 498 (2012).
D. Walton, J. Chem. Phys. 37, 2182 (1962).
T. Futschek, J. Hafner, and M. Marsman, J. Phys.: Condens. Matter 18, 9703 (2006).
V. M. Kuznetsov, R. I. Kadyrov, and G. E. Rudenskii, J. Mater. Sci. Technol. 14, 320 (1998).
C. V. Thompson, Annu. Rev. Mater. Sci. 30, 159 (2000).
H. Masumoto, H. Saito, and Y. Murakami, Mater. Trans., JIM 10, 119 (1969).
R. P. U. Karunaisiri, R. Bruinsma, and J. Rudnick, Phys. Rev. Lett. 62, 788 (1989).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © A.S. Dzhumaliev, Yu.V. Nikulin, Yu.A. Filimonov, 2016, published in Zhurnal Tekhnicheskoi Fiziki, 2016, Vol. 86, No. 6, pp. 126–131.
Rights and permissions
About this article
Cite this article
Dzhumaliev, A.S., Nikulin, Y.V. & Filimonov, Y.A. Formation of textured Ni(200) and Ni(111) films by magnetron sputtering. Tech. Phys. 61, 924–928 (2016). https://doi.org/10.1134/S1063784216060141
Received:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063784216060141