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Joint functioning of a magnetron sputtering system and an end-hall ion source

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Abstract

The features of joint operation of a magnetron sputtering system (MSS) and an end-Hall ion source (EHIS) are investigated. It is noted that the initiation of the magnetron discharge leads to partial or complete neutralization of the ion beam generated by the EHIS; in other words, in some regimes of the MSS, the ion source operates in the filament-free regime. In such a case, the magnetron discharge is the source of electrons required for sustaining the discharge and for compensating the ion beam from the EHIS. The dependences of the discharge characteristics of the EHIS and MSS are established when a filament neutralizer and MSS discharge are used for compensating the EHIS ion beam. The balance of currents in the ion source-magnetron sputtering system is considered by analyzing the joint functioning of the MSS and EHIS. It is shown that the maximal discharge current from the ion source for which the charge compensation condition is preserved depends on the unbalance and the magnetron discharge current.

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Authors and Affiliations

  1. Belarussian State University of Informatics and Radioelectronics, ul. P. Brovki 6, Minsk, 220013, Belarus

    D. A. Golosov & S. M. Zavadski

  2. Plasma Coating Technology Department, Changwon, Korea Institute of Materials Science, 797 Changwon-Daero, Sangsan-Gu, 642-831, Republic of Korea

    Byon Eungsun

Authors
  1. D. A. Golosov
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  2. Byon Eungsun
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  3. S. M. Zavadski
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Correspondence to D. A. Golosov.

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Original Russian Text © D.A. Golosov, Byon Eungsun, S.M. Zavadski, 2014, published in Zhurnal Tekhnicheskoi Fiziki, 2014, Vol. 84, No. 9, pp. 66–73.

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Golosov, D.A., Eungsun, B. & Zavadski, S.M. Joint functioning of a magnetron sputtering system and an end-hall ion source. Tech. Phys. 59, 1326–1333 (2014). https://doi.org/10.1134/S1063784214090096

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  • DOI: https://doi.org/10.1134/S1063784214090096

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