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Effect of bulk modification of polymers in a directional low-temperature plasma flow

  • Gas Discharges, Plasma
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Abstract

A mechanism explaining the kinetics of polymer etching and the formation of modified layers in the plasma generated by a high-voltage gas discharge outside the electrode gap is proposed and substantiated from a unified point of view based on the Thomson-Widdington law. The effect of bulk modification of a polymer is discovered, which upgrades the knowledge of the processes occurring during polymer interaction with a low-temperature plasma.

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References

  1. W. M. Moreau, Semiconductor Lithography: Principles, Practices, and Materials (Plenum, New York, 1988; Mir, Moscow, 1990), Chap. 1.

    Google Scholar 

  2. K. A. Valiev, T. M. Makhviladze, and M. E. Sarychev, Dokl. Akad. Nauk SSSR 283, 366 (1985) [Sov. Phys. Dokl. 30, 609 (1985)].

    Google Scholar 

  3. M. E. Sarychev, Tr. FTIAN 3, 74 (1992).

    Google Scholar 

  4. K. A. Valiev, K. Ya. Mokrousov, and A. A. Orlikovskii, Poverkhnost’, No. 1, 53 (1987).

  5. A. A. Orlikovskii, Mikroelektronika 28, 415 (1999).

    Google Scholar 

  6. Yu. P. Raizer, Gas Discharge Physics (Nauka, Moscow, 1987; Springer, Berlin, 1991).

    Google Scholar 

  7. N. L. Kazanskii, V. A. Kolpakov, and A. I. Kolpakov, Mikroelektronika 33, 209 (2004).

    Google Scholar 

  8. I. V. Vagner, E. I. Bolgov, V. F. Grakun, V. L. Gokhvel’d, and V. A. Kudlai, Zh. Tekh. Fiz. 44, 1669 (1974) [Sov. Phys. Tech. Phys. 19, 1042 (1974)].

    Google Scholar 

  9. A. N. Komov, A. I. Kolpakov, N. I. Bondareva, and V. V. Zakharenko, Prib. Tekh. Eksp., No. 5, 218 (1984).

  10. V. A. Kolpakov, A. I. Kolpakov, and S. V. Krichevskii, Elektronnaya Prom-st, No. 2, 41 (1996).

  11. V. A. Kolpakov, Fiz. Khim. Obrab. Mater., No. 5, 41 (2006).

  12. V. A. Kolpakov and A. I. Kolpakov, Pis’ma Zh. Tekh. Fiz. 25(15), 58 (1999) [Tech. Phys. Lett. 25, 618 (1999)].

    Google Scholar 

  13. G. F. Ivanovskii and V. I. Petrov, Ion—Plasma Treatment of Materials (Radio i Svyaz’, Moscow, 1986) [in Russian].

    Google Scholar 

  14. N. N. Rykalin, I. V. Zuev, and A. A. Uglov, Principles of Electron—Beam Treatment of Materials (Mashinostroenie, Moscow, 1978) [in Russian].

    Google Scholar 

  15. V. K. Popov, Fiz. Khim. Obrab. Mater., No. 4, 11 (1967).

  16. G. M. Bartenev and A. G. Barteneva, Relaxation Properties of Polymers (Khimiya, Moscow, 1992) [in Russian].

    Google Scholar 

  17. F. Bechstedt and R. Enderlein, Semiconductor Surfaces and Interfaces (Akademie-Verlag, Berlin, 1988; Mir, Moscow, 1990).

    Google Scholar 

  18. V. A. Kolpakov, Mikroelektronika 31, 431 (2002).

    Google Scholar 

  19. V. A. Kolpakov, Candidate’s Dissertation (SGAU ISOI RAN, Samara, 2004).

    Google Scholar 

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Correspondence to V. A. Kolpakov.

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Original Russian Text © N.L. Kazanskii, V.A. Kolpakov, 2009, published in Zhurnal Tekhnicheskoĭ Fiziki, 2009, Vol. 79, No. 9, pp. 41–46.

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Kazanskii, N.L., Kolpakov, V.A. Effect of bulk modification of polymers in a directional low-temperature plasma flow. Tech. Phys. 54, 1284–1289 (2009). https://doi.org/10.1134/S1063784209090060

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  • DOI: https://doi.org/10.1134/S1063784209090060

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