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X-Ray Diffraction Analysis of Features of the Crystal Structure of GaN/Al0.32Ga0.68N HEMT-Heterostructures by the Williamson–Hall Method

  • Semiconductor Structures, Low-Dimensional Systems, and Quantum Phenomena
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Abstract

The fitting of θ/2θ and ω peaks in X-ray diffraction curves is shown to be most accurate in the case of using an inverse fourth-degree polynomial or probability density function with Student’s distribution (Pearson type VII function). These functions describe well both the highest-intensity central part of the experimental peak and its low-intensity broadened base caused by X-ray diffuse scattering. The mean microdeformation ε and mean vertical domain size D are determined by the Williamson–Hall method for layers of GaN (ε ≈ 0.00006, D ≈ 200 nm) and Al0.32Ga0.68N (ε = 0.0032 ± 0.0005, D = 24 ± 7 nm). The D value obtained for the Al0.32Ga0.68N layer is most likely to result from the nominal thickness of this layer, which is 11 nm.

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Correspondence to S. S. Pushkarev.

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Original Russian Text © S.S. Pushkarev, M.M. Grekhov, N.V. Zenchenko, 2018, published in Fizika i Tekhnika Poluprovodnikov, 2018, Vol. 52, No. 6, pp. 586–590.

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Pushkarev, S.S., Grekhov, M.M. & Zenchenko, N.V. X-Ray Diffraction Analysis of Features of the Crystal Structure of GaN/Al0.32Ga0.68N HEMT-Heterostructures by the Williamson–Hall Method. Semiconductors 52, 734–738 (2018). https://doi.org/10.1134/S1063782618060209

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  • DOI: https://doi.org/10.1134/S1063782618060209

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