Abstract
Experimental data on the spontaneous emission and absorption modulation in boron-doped silicon under CO2 laser excitation depending on the uniaxial stress applied along the [001] and [011] crystallographic directions are presented. Room-temperature radiation is used as the probe radiation. Low stress (less than 0.5 kbar) is shown to reduce losses in the terahertz region by 20%. The main contribution to absorption modulation at zero and low stress is made by A + centers. Intersubband free hole transitions additionally contribute to terahertz absorption at higher stress. These contributions can be minimized by compensation.
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Original Russian Text © R.Kh. Zhukavin, K.A. Kovalevsky, M.L. Orlov, V.V. Tsyplenkov, H.-W. Hübers, N. Dessmann, D.V. Kozlov, V.N. Shastin, 2016, published in Fizika i Tekhnika Poluprovodnikov, 2016, Vol. 50, No. 11, pp. 1479–1483.
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Zhukavin, R.K., Kovalevsky, K.A., Orlov, M.L. et al. Terahertz absorption and emission upon the photoionization of acceptors in uniaxially stressed silicon. Semiconductors 50, 1458–1462 (2016). https://doi.org/10.1134/S1063782616110270
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DOI: https://doi.org/10.1134/S1063782616110270