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Method for the Iterative Refinement of Parameter Values in Analytical Models of Microelectronic Devices Based on Integrated MOS Transistors

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Abstract

Physical models of MOS transistors used in the design of modern integrated circuits are typically accurate, which makes it possible to model their operation with a specified degree of reliability. However, they are also highly complex, which makes them impractical to use when analyzing and predicting the operation of designed devices. Therefore, less accurate, but more compact analytical models of transistors and devices based on them are usually used for estimation and prediction. At the same time, for calculations and estimations, the values of all parameters contained in the model equations cannot be always known sufficiently accurately. In the paper, using the example of a previously developed analytical model of a voltage multiplier and the results of modeling a voltage multiplier developed using 180-nm CMOS technology, we present a method for refining the parameter values of analytical models describing devices based on integrated MOS transistors.

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ACKNOWLEDGMENTS

When performing the work, software and hardware tools of the Central Collective Use Center “Microsystem Technology and Electronic Component Base,” National Research University of Electronic Technology (MIET) were used.

Funding

This study was supported as part of the “Development and research of methods and tools for monitoring, diagnosing, and predicting the state of engineering objects based on artificial intelligence” project, task no. FENW-2020-0022, work no. LAB0110/2020-01DC in Southern Federal University).

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Correspondence to A. S. Sinyukin or A. V. Kovalev.

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The authors declare that they have no conflicts of interest.

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Translated by A. Ivanov

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Sinyukin, A.S., Kovalev, A.V. Method for the Iterative Refinement of Parameter Values in Analytical Models of Microelectronic Devices Based on Integrated MOS Transistors. Russ Microelectron 51, 398–403 (2022). https://doi.org/10.1134/S1063739722700056

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  • DOI: https://doi.org/10.1134/S1063739722700056

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