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Visualization of Defects on the Semiconductor Surface Using a Dielectric Barrier Discharge

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Abstract

It is demonstrated that plasma techniques can be used to detect various defects on a solid surface by a self-sustained discharge under atmospheric pressure. Special attention is paid to controlling surface defects and the end cleavages of semiconducting wafers and pinholes of layered structures.

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Authors and Affiliations

  1. Ivanovo State University of Chemistry and Technology, Ivanovo, 153000, Russia

    D. V. Sitanov & S. A. Pivovarenok

Authors
  1. D. V. Sitanov
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  2. S. A. Pivovarenok
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Correspondence to D. V. Sitanov.

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Original Russian Text © D.V. Sitanov, S.A. Pivovarenok, 2018, published in Mikroelektronika, 2018, Vol. 47, No. 1.

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Sitanov, D.V., Pivovarenok, S.A. Visualization of Defects on the Semiconductor Surface Using a Dielectric Barrier Discharge. Russ Microelectron 47, 34–39 (2018). https://doi.org/10.1134/S1063739718010067

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  • DOI: https://doi.org/10.1134/S1063739718010067

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