Abstract
The laws of formation of a continuous deposit layer at a given direct current are considered. Equations are analyzed to calculate the time dependences of overpotential for instantaneous nucleation with kinetic or diffusion control of new-phase growth. The calculated dependences are compared with the experimental ones obtained for silicon electrodeposition from a fluoride–chloride melt.
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ACKNOWLEDGMENTS
This work was supported by the Russian Science Foundation, project no. 16-13-00061.
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Translated by K. Shakhlevich
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Isaev, V.A., Grishenkova, O.V., Laptev, M.V. et al. Formation of an Electrode Deposit under Galvanostatic Conditions. Russ. Metall. 2018, 763–766 (2018). https://doi.org/10.1134/S0036029518080086
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DOI: https://doi.org/10.1134/S0036029518080086