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Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond

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Abstract

It was found that in a hydrogen-methane mixture in microwave plasma reactor for diamond deposition, there is a threshold pressure after which the contraction of microwave discharge occurs. The results of measurements of gas temperature and spatial distributions of optical emission intensity of discharge are presented. The mechanism of discharge contraction is discussed.

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REFERENCES

  1. R. S. Balmer, J. R. Brandon, S. L. Clewes, H. K. Dhillon, J. M. Dodson, I. Friel, P. N. Inglis, T. D. Madgwick, M. L. Markham, and T. P. Mollart, J. Phys.: Condens. Matter 21, 364221 (2009). https://doi.org/10.1088/0953-8984/21/36/364221

    Google Scholar 

  2. Power Electronics Device Applications of Diamond Semiconductors, Ed. by S. Koizumi, H. Umezawa, J. Pernot, and M. Suzuki (Woodhead, Duxford, UK, 2018).

    Google Scholar 

  3. Y. Gu, J. Lu, T. Grotjohn, T. Schuelke, and J. Asmussen, Diamond Relat. Mater. 24, 210 (2012). https://doi.org/10.1016/j.diamond.2012.01.026

    Article  ADS  Google Scholar 

  4. A. B. Muchnikov, A. L. Vikharev, A. M. Gorbachev, D. B. Radishev, V. D. Blank, and S. A. Terentiev, Diamond Relat. Mater 19, 432 (2010). https://doi.org/10.1016/j.diamond.2009.11.012

    Article  ADS  Google Scholar 

  5. M. A. Lobaev, S. A. Bogdanov, D. B. Radishev, A. L. Vikharev, and A. M. Gorbachev, Diamond Relat. Mater. 66, 177 (2016). https://doi.org/10.1016/j.diamond.2016.05.004

    Article  ADS  Google Scholar 

  6. N. Derkaoui, C. Rond, K. Hassouni, and A. Gicquel, J. Appl. Phys. 115, 233301 (2014). https://doi.org/10.1063/1.4883955

    Article  ADS  Google Scholar 

  7. D. G. Goodwin, J. Appl. Phys. 74, 6888 (1993). https://doi.org/10.1063/1.355063

    Article  ADS  Google Scholar 

  8. A. G. Gaydon and H. G. Wolfhard, Proc. R. Soc. London, Ser. A 201, 561 (1950).

    Article  ADS  Google Scholar 

  9. X. Duten, A. Rousseau, A. Gicquel, and P. Leprince, J. Appl. Phys. 86, 5299 (1999). https://doi.org/10.1063/1.371515

    Article  ADS  Google Scholar 

  10. Y. P. Raizer, Gas Discharge Physics (Nauka, Moscow, 1987; Springer, Berlin, Heidelberg, 1991).

  11. A. A. Fridman and L. A. Kennedy, Plasma Physics and Engineering (Taylor and Francis, Routledge, 2004).

    Book  Google Scholar 

  12. A. L. Vikharev, A. M. Gorbachev, and D. B. Radishev, J. Phys. D: Appl. Phys. 52, 014001 (2019). https://doi.org/10.1088/1361-6463/aae3a3

    Article  ADS  Google Scholar 

  13. J. Ma, M. N. R. Ashfold, and Y. A. Mankelevich, J. Appl. Phys. 105, 043302 (2009). https://doi.org/10.1063/1.3078032

    Article  ADS  Google Scholar 

  14. Yu. A. Lebedev and I. L. Epshtein, High Temp. 36, 510 (1998).

    Google Scholar 

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Correspondence to A. M. Gorbachev.

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Bogdanov, S.A., Gorbachev, A.M., Radishev, D.B. et al. Contraction of Microwave Discharge in the Reactor for Chemical Vapor Deposition of Diamond. Tech. Phys. Lett. 45, 89–92 (2019). https://doi.org/10.1134/S1063785019020032

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  • DOI: https://doi.org/10.1134/S1063785019020032

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