Abstract
Lithography techniques compatible with silicon technology have been developed within the hydrothermal method. Topological layouts were formed by faceted microcrystals with the developed surface. The prospects for implementing new hierarchical structures are of special interest.
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Original Russian Text © A.A. Bobkov, I.A. Pronin, V.A. Moshnikov, N.D. Yakushova, A.A. Karmanov, I.A. Averin, P.A. Somov, E.I. Terukov, 2018, published in Pis’ma v Zhurnal Tekhnicheskoi Fiziki, 2018, Vol. 44, No. 15, pp. 87–92.
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Bobkov, A.A., Pronin, I.A., Moshnikov, V.A. et al. Creating Lithographic Pictures Using Faceted Zinc Oxide Microparticles on a Silicon Substrate. Tech. Phys. Lett. 44, 694–696 (2018). https://doi.org/10.1134/S1063785018080047
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DOI: https://doi.org/10.1134/S1063785018080047