Abstract
Photoinduced enhancement of the solubility of annealed films made of chalcogenide glassy semiconductors (ChGSs) in amine-based selective etchants has been observed. The etching rate increases with the illumination intensity, and its spectral dependence is correlated with absorption in the film at the absorption edge. It is demonstrated that the new photoinduced effect enables a photolithographic process (including interference lithography) to occur on ChGS layers, annealed at a temperature close to the glass-transition temperature of a chalcogenide glass by simultaneous illumination and selective etching of layers of this kind. A possible mechanism for the photoinduced etching of ChGSs is discussed.
Similar content being viewed by others
References
Y. Mizushima and A. Yoshikava, in Amorphous Semiconductor Technology and Devices, Ed. by Y. Hamakava (OHM, Tokyo, Amsterdam, 1982), p. 277.
G. H. Bernstein, W. P. Liu, Y. N. Khawaja, M. N. Kozicki, and D. K. Ferry, J. Vac. Sci. Technol. B 6, 2298 (1988).
K. Saito, Y. Utsugi, and A. Yoshikawa, J. Appl. Phys. 63, 565 (1988).
S. H. Wong, M. Thiel, P. Brodersen, D. Fenske, G. A. Ozin, M. Wegener, and G. von Freymann, Chem. Mater. 19, 4213 (2007).
M. Wuttig and N. Yamada, Nature Mater. 6, 824 (2007).
I. Z. Indutnyi, M. T. Kostyshin, O. P. Kasyarum, V. I. Min’ko, E. V. Mikhailovskaya, and P. F. Romanenko, Photoinduced Interactions in Metal-Semiconductor Structures (Nauch. Mysl’, Kyiv, 1992) [in Russian].
Photo-Induced Metastability in Amorphous Semiconductors, Ed. by A. V. Kolobov (Wiley, New York, 2003).
K. Richardson, L. Petit, N. Carlie, B. Zdyrko, I. Luzinov, J. Hu, A. Agarwal, L. Kimerling, T. Anderson, and M. Richardson, J. Nonlinear Opt. Phys. Mater. 19, 75 (2010).
M.-L. Anne, J. Keirsse, V. Nazabal, K. Hyodo, S. Inoue, C. Boussard-Pledel, H. Lhermite, J. L. Carrier, K. Yanakata, O. Loreal, J. le Person, F. Colas, C. Compere, and B. Bureau, Sesors 9, 7398 (2009).
A. V. Kolobov and K. Tanaka, Semiconductors 32, 801 (1998).
A. Ganjoo, H. Jain, and S. Khalid, J. Non-Cryst. Sol. 354, 2673 (2008).
I. Z. Indutnyi, A. V. Stronski, P. E. Schepeljavi, S. A. Kostioukevitch, P. F. Romanenko, and I. I. Robur, Opt. Eng. 34, 1030 (1995).
V. A. Dan’ko, I. Z. Indutnyi, V. I. Min’ko, and P. E. Shepelyavyi, Optoelectron. Instrum. Data Proc. 46, 483 (2010).
Thin Film Microelectronics, Ed. by L. Holland (Chapman and Hall, London, 1965; Moscow, Mir, 1968).
A. I. Stetsun, Extended Abstract of Candidate’s Dissertations (Inst. Phys. Semiconductors, Natl. Acad. Sci. Ukraine, Kyiv, 1994).
S. A. Zenkin, S. B. Mamedov, G. D. Mikhailov, E. Yu. Turkina, and I. Yu. Yusupov, Glass Phys. Chem. 23, 393 (1997).
G. C. Chern and I. Lauks, J. Appl. Phys. 54, 4596 (1983).
J. Orava, T. Wagner, M. Krbal, T. Kohoutek, Mil. Vlcek, P. Klapetek, and M. Frumar, J. Non-Cryst. Sol. 354, 533 (2008).
M. L. Trunov, P. M. Lytvyn, P. M. Nagy, and O. M. Dyachyns’ka, Appl. Phys. Lett. 96, 11908 (2010).
K. Tanaka, N. Kawakami, and A. Odajima, Jpn. J. Appl. Phys. pt. 1 20, 1874 (1981).
A. V. Kolobov and K. Tanaka, in Handbook of Advanced Electronic and Photonic Materials and Devices, Ed. by H. S. Nalwa (Academic, San Diego, 2001), vol. 5, ch. 2.
H. Fritzsche, Solid State Commun. 99, 153 (1996).
Author information
Authors and Affiliations
Corresponding author
Additional information
Original Russian Text © V.A. Dan’ko, I.Z. Indutnyi, V.I. Min’ko, P.E. Shepelyavyi, O.V. Bereznyova, O.S. Lytvyn, 2012, published in Fizika i Tekhnika Poluprovodnikov, 2012, Vol. 46, No. 4, pp. 520–524.
Rights and permissions
About this article
Cite this article
Dan’ko, V.A., Indutnyi, I.Z., Min’ko, V.I. et al. Photoinduced etching of thin films of chalcogenide glassy semiconductors. Semiconductors 46, 504–508 (2012). https://doi.org/10.1134/S1063782612040057
Received:
Accepted:
Published:
Issue Date:
DOI: https://doi.org/10.1134/S1063782612040057