Abstract
A method for studying the correlations between substrate and film-coating profiles by atomic force microscopy, which makes it possible to calculate the correlation factor (a function of spatial frequency), has been developed. The spatial-frequency range in which the correlation factor can be reliably calculated is established. The method proposed is used to calculate the dependence of the correlation factor on spatial frequency for multilayer interference mirror elements.
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Original Russian Text © J.V. Grishchenko, M.L. Zanaveskin, 2013, published in Kristallografiya, 2013, Vol. 58, No. 3, pp. 484–489.
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Grishchenko, J.V., Zanaveskin, M.L. Investigation into the correlation factor of substrate and multilayer film surfaces by atomic force microscopy. Crystallogr. Rep. 58, 493–497 (2013). https://doi.org/10.1134/S1063774513030061
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DOI: https://doi.org/10.1134/S1063774513030061