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Sputtering of highly oriented pyrolytic graphite with 30 keV Argon ions

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Abstract

The influence of the incidence angle of 30 keV Ar+ ions, ion fluence and target temperature on the sputtering yield and surface microgeometry of highly oriented pyrolytic graphite (UPV-1T) samples was experimentally studied. It was found that at fluences more than 5 × 1019 ion cm−2 the sputtering yield at room temperature in the range of the ion incidence angle from 0° to 80° is twice as small as the corresponding experimental data for both polycrystalline graphite and glassy carbon. The analysis of ion-induced relief permits us to suppose the topographical suppression mechanism of highly oriented pyrolytic graphite sputtering.

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Authors and Affiliations

  1. Skobeltsyn Institute of Nuclear Physics, Moscow State University, Moscow, 119991, Russia

    N. N. Andrianova, A. M. Borisov & E. S. Mashkova

Authors
  1. N. N. Andrianova
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  2. A. M. Borisov
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  3. E. S. Mashkova
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Additional information

Original Russian Text © N.N. Andrianova, A.M. Borisov, E.S. Mashkova, 2009, published in Poverkhnost’. Rentgenovskie, Sinkhrotronnye i Neitronnye Issledovaniya, No. 4, pp. 77–81.

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Andrianova, N.N., Borisov, A.M. & Mashkova, E.S. Sputtering of highly oriented pyrolytic graphite with 30 keV Argon ions. J. Surf. Investig. 3, 322–325 (2009). https://doi.org/10.1134/S1027451009020281

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  • DOI: https://doi.org/10.1134/S1027451009020281

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