Abstract
Films of hydrogenated SiC x N y O z :H obtained by plasma-enhanced chemical vapor deposition from a mixture of 1,1,3,3-tetramethyldisilazane with oxygen and nitrogen (TMDS+ O2+xN2) in the temperature range 373-973 K are nanocomposites in whose amorphous part nanocrystals belonging to phases of the Si–C–N: α-Si3–x C x N4 system and graphite are distributed. A change in the chemical composition of gas mixtures enables the preparation of SiC x N y O z :H films with a broad variation range of functional properties, such as the 1.45-2.15 variation of the refractive index; the controlled transparency (T ~ 92-99.7%) in the UV, visible, and IR spectral ranges; tunable characteristics of the band gap (3.5-5.4 eV), and dielectric constants (5.2-5.8).
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Original Russian Text © 2016 A. G. Plekhanov, N. I. Fainer, Yu. M. Rumyantsev, I. V. Yushina, and M. I. Rakhmanova.
Translated from Zhurnal Strukturnoi Khimii, Vol. 57, No. 6, pp. 1271-1278, July-August, 2016.
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Plekhanov, A.G., Fainer, N.I., Rumyantsev, Y.M. et al. The phase composition and physicochemical properties of transparent nanocomposite films of silicon oxycarbonitride. J Struct Chem 57, 1209–1215 (2016). https://doi.org/10.1134/S0022476616060226
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DOI: https://doi.org/10.1134/S0022476616060226