Skip to main content
Log in

Thermomigration Kinetics in the Si–Al–Ga and Si–Al–Sn Systems

  • Published:
Inorganic Materials Aims and scope

Abstract

The thermodynamics and kinetics of the thermomigration of molten zones based on Al–Ga and Al–Ga melts in the preparation of silicon epilayers have been studied in detail. We have determined the threshold thermomigration temperature for zones of various compositions. The migration onset temperature has been shown to increase monotonically with increasing Ga or Sn concentration in the liquid phase. The thermomigration rate of Si–Al–Ga zones decreases with increasing gallium concentration at temperatures below 1473 K and increases at higher temperatures. The thermomigration rate of Si–Al–Sn zones decreases with increasing Sn concentration over the entire temperature range studied. No chemical compounds have been detected in the Si–Al–Ga or Si–Al–Sn system, which simplifies the use of the thermomigration method in these systems.

This is a preview of subscription content, log in via an institution to check access.

Access this article

Price excludes VAT (USA)
Tax calculation will be finalised during checkout.

Instant access to the full article PDF.

Similar content being viewed by others

References

  1. Lozovskii, V.N., Lunin, L.S., and Popov, V.P., Zonnaya perekristallizatsiya gradientom temperatury poluprovodnikovykh materialov (Temperature-Gradient Zone Recrystallization of Semiconductor Materials), Moscow: Metallurgiya, 1987.

    Google Scholar 

  2. Lozovskii, V.N., Popov, V.P., and Seredin, B.M., Comparison of epitaxial and diffusion methods of producing radiation-resistant structures of power semiconductor devices, Vopr. At. Nauki Tekh., Ser.: Fiz. Radiats. Vozdeistvii Radioelektron. Apparat., 2015, no. 33, pp. 57–61.

    Google Scholar 

  3. Lozovskii, V.N., Lunin, L.S., and Seredin, B.M., Effect of the anode junction profile in power device structures on the direct voltage drop, Elektromekhanika, 2015, no. 5, pp. 54–58.

    Google Scholar 

  4. Lozovskii, V.N., Lunin, L.S., and Seredin, B.M., Fabrication of power silicon devices using thermomigration, Elektron. Tekh., Ser. 2: Poluprovodn. Prib., 2015, nos. 2–3, pp. 105–115.

    Google Scholar 

  5. Lozovskii, V.N., Seredin, B.M., Polukhin, A.S., et al., Equipment for the fabrication of silicon structures using thermomigration, Elektron. Tekh., Ser. 2: Poluprovodn. Prib., 2015, no. 5, pp. 65–76.

    Google Scholar 

  6. Seredin, B.M. and Blagin, A.V., Deformation of flat solvent layers during thermomigration through silicon substrates, Izv. Vyssh. Uchebn. Zaved. Sev.-Kavk. Region. Tekh. Nauki, 2013, no. 6, pp. 122–127.

    Google Scholar 

  7. Kuznetsov, V.V., Moskvin, P.P., and Sorokin, B.C., Neravnovesnye yavleniya pri zhidkostnoi geteroepitaksii poluprovodnikovykh tverdykh rastvorov (Nonequilibrium Phenomena in Liquid Phase Heteroepitaxy of Semiconductor Solid Solutions), Moscow: Metallurgiya, 1991.

    Google Scholar 

  8. Binneweis, M. and Milke, E., Thermochemical Data of Elements and Compounds, Weinheim: Wiley–VCH, 2002, 2nd ed.

    Book  Google Scholar 

  9. Popov, V.P., Balyuk, A.V., Seredin, B.M, et al., RF Patent 1524555, Byull. Izobret., 2016, no. 10.

Download references

Author information

Authors and Affiliations

Authors

Corresponding author

Correspondence to B. M. Seredin.

Additional information

Original Russian Text © V.V. Kuznetsov, V.N. Lozovskii, V.P. Popov, E.R. Rubtsov, B.M. Seredin, 2018, published in Neorganicheskie Materialy, 2018, Vol. 54, No. 1, pp. 35–39.

Rights and permissions

Reprints and permissions

About this article

Check for updates. Verify currency and authenticity via CrossMark

Cite this article

Kuznetsov, V.V., Lozovskii, V.N., Popov, V.P. et al. Thermomigration Kinetics in the Si–Al–Ga and Si–Al–Sn Systems. Inorg Mater 54, 32–36 (2018). https://doi.org/10.1134/S0020168518010065

Download citation

  • Received:

  • Published:

  • Issue Date:

  • DOI: https://doi.org/10.1134/S0020168518010065

Keywords

Navigation