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Etching and chemical mechanical polishing of ZnSe using inorganic acids

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Abstract

The etching behavior of zinc selenide has been studied at temperatures from 20 to 90°C in inorganic acid solutions of different concentrations, with additions of H2O2 as an oxidant. The kinetic data obtained have been used to identify the mechanisms of the reactions involved and develop a chemical mechanical polishing procedure for polycrystalline zinc selenide.

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Authors and Affiliations

  1. Institute of Chemistry of High-Purity Substances, Russian Academy of Sciences, ul. Tropinina 49, Nizhni Novgorod, 603950, Russia

    E. Yu. Vilkova & O. V. Timofeev

  2. Lobachevsky State University, pr. Gagarina 23, Nizhni Novgorod, 603600, Russia

    O. V. Timofeev

Authors
  1. E. Yu. Vilkova
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  2. O. V. Timofeev
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Correspondence to O. V. Timofeev.

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Original Russian Text © E.Yu. Vilkova, O.V. Timofeev, 2012, published in Neorganicheskie Materialy, 2012, Vol. 48, No. 5, pp. 530–535.

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Vilkova, E.Y., Timofeev, O.V. Etching and chemical mechanical polishing of ZnSe using inorganic acids. Inorg Mater 48, 451–455 (2012). https://doi.org/10.1134/S002016851204019X

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  • DOI: https://doi.org/10.1134/S002016851204019X

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