Abstract
Boron carbonitride films of various compositions have been grown by plasma-enhanced chemical vapor deposition using N-trimethylborazine as a single-source precursor and nitrogen as a plasma gas and an additional nitrogen source. Experiments were performed at various deposition temperatures and rf powers. The films were characterized by ellipsometry, atomic force microscopy, scanning electron microscopy, X-ray photoelectron spectroscopy, IR and Raman spectroscopies, synchrotron X-ray diffraction, energy dispersive X-ray microanalysis, and spectrophotometry. The results demonstrate that, under the conditions of this study, the growth kinetics and physicochemical properties of boron carbonitride layers are influenced by both the substrate temperature and rf power. Conditions are found for producing boron carbonitride films transparent in the UV through visible spectral region.
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Freudenstein, R., Reinke, S., and Kulisch, W., Investigation of the Nucleation Layer in c-BN Film Growth, Diamond Relat. Mater., 1997, vol. 6, pp. 584–588.
Jorg, A., Neuschutz, D., and Zimmermann, E., Kinetics of Chemical Vapour Deposition of Boron Nitride from a Gas Mixture of Trimethylborazine, Ammonia, and Hydrogen at 900 to 1050°C and 1 bar Total Pressure, J. Phys. IV, Colloque C5, 1995, vol. 5, pp. C5-167–C5-174.
Jorg, A., Zimmermann, E., Schierling, M., et al., Constitution and Deposition Mechanism of Hexagonal Boron Nitride Formed by CVD from Trimethylborazine, Electrochem. Soc. Proc., 1997, vol. 97–25, pp. 504–511.
Stokel, S., Weise, K., Dietrich, D., et al., Influence of Composition and Structure on the Mechanical Properties of BCN Coatings Deposited by Thermal CVD, Thin Solid Films, 2002, vols. 420–421, pp. 465–471.
Ratna Phani, A., Sujit Roy, and Rao, V.J., Growth of Boron Nitride Thin Films by Metal-Organic Chemical Vapour Deposition, Thin Solid Films, 1995, vol. 258, nos. 1–2, pp. 21–25.
Thamm, T., Korner, K.-U., Bohne, W., et al., Characterization of PECVD Boron Carbonitride Layers, Appl. Surf. Sci., 2005, vol. 252, pp. 223–226.
Weber, A., Bringmann, U., Klages, C.P., et al., Plasma Deposition of BN, BCN:H and Me-BCN:H Films Using N-Trimethylborazine (Me = Ti, Nb), J. Phys. III, 1992, vol. 2, no. 8, pp. 1391–1398.
Golubenko, A.N., Kosinova, M.L., Sulyaeva, V.S., et al., Thermodynamic Modeling of BCxNy Chemical Vapor Deposition from Mixtures of N-Trimethylborazine and Nitrogen, Neorg. Mater., 2009, vol. 45, no. 12, pp. 1436–1440 [Inorg. Mater. (Engl. Transl.), vol. 45, no. 12, pp. 1342–1345].
Kosinova, M.L., Fainer, N.I., Rumyantsev, Yu.M., et al., Growth of Homogeneous and Gradient BCxNy Films by PECVD Using Trimethylamino Borane Complex, Proc. Int. Symp. Chemical Vapor Deposition XVI and EUROCVD 14, 2003, vol. 8, pp. 708–715.
Geick, R., Perry, C.H., and Rupprecht, G., Normal Modes in Hexagonal Boron Nitride, Phys. Rev., 1966, vol. 146, no. 2, pp. 543–547.
Niedenzu, K., Sawodny, W., Watanabe, H., et al., The Vibrational Spectrum of Borazine, Inorg. Chem., 1967, vol. 6, no. 8, pp. 1453–1461.
Halverson, W.D., Tetreanet, T.G., and Hirvonen, J.K., Ion Assisted Synthesis of Boron Nitride Coatings, Mater. Sci. Forum, 1990, vols. 54–55, pp. 71–110.
Tuinstra, F. and Koenig, J.L., Raman Spectrum of Graphite, J. Chem. Phys., 1970, vol. 53, no. 3, pp. 1126–1130.
Ferrari, A.C. and Robertson, J., Resonant Raman Spectroscopy of Disordered, Amorphous, and Diamondlike Carbon, Phys. Rev. B: Condens. Matter Mater. Phys., 2001, vol. 64, paper 075414.
Polo, M.C., Martinez, E., Esteve, J., and Andujar, J.L., Preparation of B-C-N Thin Films by r.f. Plasma Assisted CVD, Diamond Relat. Mater., 1998, vol. 7, pp. 376–379.
Powder Diffraction File, Swarthmore: Joint Committee on Powder Diffraction Standards, 1988, vol. 35, card no. 798.
Powder Diffraction File, Swarthmore: Joint Committee on Powder Diffraction Standards, 1988, vol. 34, card no. 421.
Powder Diffraction File, Swarthmore: Joint Committee on Powder Diffraction Standards, 1988, vol. 35, card no. 1292.
Leavy, R.A., Mastromatteo, E., Grow, J.M., et al., Low Pressure Chemical Vapor Deposition of B-C-N-H Films from Triethylamine Borane Complex, J. Mater. Res., 1995, vol. 10, no. 2, pp. 320–327.
Cao, Z.X. and Oechsner, H., Optical and Mechanical Characteristics of Nanocrystalline Boron Carbonitride Films Synthesized by Plasma-Assisted Physical Vapor Deposition, J. Appl. Phys., 2003, vol. 93, no. 2, pp. 1186–1189.
Boo, J.-H., Rohr, C., and Ho, W., Growth of Boron Nitride Thin Films on Silicon Substrates Using New Organoboron Precursors, Phys. Status Solidi A, 1999, vol. 176, pp. 705–710.
Tauc, J., Grigorovichi, R., and Vancu, A., Optical Properties and Electronic Structure of Amorphous Germanium, Phys. Status Solidi, 1966, vol. 15, no. 2, pp. 627–637.
Andujar, J.L., Bertran, E., and Polo, M.C., Plasma-Enhanced Chemical Vapor Deposition of Boron Nitride Thin Films from B2H6-H2-NH3 and B2H6-N2 Gas Mixtures, J. Vac. Sci. Technol., A, 1998, vol. 16, no. 2, pp. 578–586.
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Original Russian Text © V.S. Sulyaeva, M.L. Kosinova, Yu.M. Rumyantsev, A.N. Golubenko, N.I. Fainer, N.I. Alferova, B.M. Ayupov, P.N. Gevko, V.G. Kesler, B.A. Kolesov, E.A. Maksimovskii, K.G. Myakishev, I.V. Yushina, F.A. Kuznetsov, 2010, published in Neorganicheskie Materialy, 2010, Vol. 46, No. 5, pp. 555–562.
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Sulyaeva, V.S., Kosinova, M.L., Rumyantsev, Y.M. et al. Properties of BC x N y films grown by plasma-enhanced chemical vapor deposition from N-trimethylborazine-nitrogen mixtures. Inorg Mater 46, 487–494 (2010). https://doi.org/10.1134/S0020168510050092
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DOI: https://doi.org/10.1134/S0020168510050092