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EUVL System Patterning Performance
Book: EUV Lithography, Second Edition
Editor(s): Vivek Bakshi
Author(s): Patrick Naulleau, Gregg Gallatin
Published: 2018
https://doi.org/10.1117/3.2305675.ch10
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Abstract
The great promise of EUVL comes from its tremendous reduction in wavelength, it being a photon-based technology and thus free of chargedparticle limitations, and it being a projection-based demagnifying system, avoiding the problems of 1X and contact masks. The latter two characteristics make it clear that EUVL is simply an extension of conventional optical projection lithography, allowing us to leverage half a century of learning.
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CHAPTER 10
 37 PAGES
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KEYWORDS
Photomasks
Line edge roughness
Optical lithography
Extreme ultraviolet
Stochastic processes
Extreme ultraviolet lithography
Line width roughness
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