Principles And Conception Of LCVD Reactors For Photolytic And Pyrolytic Applications In Microelectronics

J. Rappe; O. Nicodeme

doi:10.1117/12.961761

11 October 1989 Principles And Conception Of LCVD Reactors For Photolytic And Pyrolytic Applications In Microelectronics

J. Rappe, O. Nicodeme

Author Affiliations +

Proceedings Volume 1138, Optical Microlithography and Metrology for Microcircuit Fabrication; (1989) https://doi.org/10.1117/12.961761
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Laser induced chemistry appears to be an important and relatively novel field of research with potential applications, for instance in microelectronics. In this area, the most developed laser processing techniques are laser lithography and laser induced pyrolytic deposition of micron scale features. This paper will focus on the laser direct writing technique where the laser is used to induce chemical vapour deposition.

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J. Rappe and O. Nicodeme "Principles And Conception Of LCVD Reactors For Photolytic And Pyrolytic Applications In Microelectronics", Proc. SPIE 1138, Optical Microlithography and Metrology for Microcircuit Fabrication, (11 October 1989); https://doi.org/10.1117/12.961761

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