Linewidth Vernier (LWV)

B. J. Lin

doi:10.1117/12.933584

13 September 1982 Linewidth Vernier (LWV)

B. J. Lin

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933584
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Linewidth control is one of the most important requirements in integrated circuit fabrication. Usually, linewidth variations after each processing step are measured with a microscope containing an eyepiece in which a scale is engraved. The precision obtained by this method is very low. To achieve a high precision, electronic image processing of optical microscopic images offers fast, non-destructive, and repeatable readings. However, these tools are expensive. They require frequent calibration to ascertain consistency of the absolute reading. A correction increment has to be established and added to the apparent linewidth for each line thickness, the composition of layers, and microscope settings such as illumination coherence, focussing condition, numerical aperture, lens aberrations, and the intensity threshold selected to define the electronic linewidth.

Citation Download Citation

B. J. Lin "Linewidth Vernier (LWV)", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933584

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