Reducing particle adhesion by material surface engineering

Mark S. Crowder; Robert Stover; Anna Lawitzke; Genevieve Devaud; Adrienne Dove; Xu Wang

doi:10.1117/12.859956

7 September 2010 Reducing particle adhesion by material surface engineering

Mark S. Crowder, Robert Stover, Anna Lawitzke, Genevieve Devaud, Adrienne Dove, Xu Wang

Proceedings Volume 7794, Optical System Contamination: Effects, Measurements, and Control 2010; 77940G (2010) https://doi.org/10.1117/12.859956
Event: SPIE Optical Engineering + Applications, 2010, San Diego, California, United States

Abstract

We have developed surface chemical modification processes which when applied to a variety of surfaces renders the surfaces resistant to particulate contamination. Chemically modified surfaces are shown to shed particles at a dramatically higher level as compared to native surfaces. This is demonstrated on a variety of surfaces that include optics, polymers, metals and silicon. The adhesive force between lunar stimulant particles (JSC-1AF) and black Kapton is measured to decrease by 95% when the black Kapton surface is chemically modified. The chemical modification process is demonstrated to not change the surface roughness of a smooth silicon wafer while decreasing particle affinity. The optical properties of chemically modified surfaces are reported. The surface modification process is robust and stable to aggressive cleaning. The particle shedding properties of chemically modified surfaces are retained after simulated extraterrestrial vacuum ultra-violet light exposure and temperature excursions to 140°C. This technology has the potential to provide a robust passive particle mitigation solution for optics, mechanical systems and particle sensitive applications.

Citation Download Citation

Mark S. Crowder, Robert Stover, Anna Lawitzke, Genevieve Devaud, Adrienne Dove, and Xu Wang "Reducing particle adhesion by material surface engineering", Proc. SPIE 7794, Optical System Contamination: Effects, Measurements, and Control 2010, 77940G (7 September 2010); https://doi.org/10.1117/12.859956

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