Direct surface relief formation in As-S(Se) layers

M. Trunov; P. Lytvyn; P. M. Nagy; Cs. Cserhati; I. Charnovich; S. Kokenyesi

doi:10.1117/12.837604

25 February 2010 Direct surface relief formation in As-S(Se) layers

M. Trunov, P. Lytvyn, P. M. Nagy, Cs. Cserhati, I. Charnovich, S. Kokenyesi

Proceedings Volume 7598, Optical Components and Materials VII; 75981H (2010) https://doi.org/10.1117/12.837604
Event: SPIE OPTO, 2010, San Francisco, California, United States

Abstract

The process of holographic recording based on a direct formation of periodic surface relief in As_xSe_1-x (0 ≤ x ≤ 0.5) and As₂S₃ layers was investigated by in situ AFM depth profiling and compared with data on diffraction efficiency η of the similar relief holographic gratings, measured in a reflection mode. It is established, that the time (exposure) dependence of η has at least two components, which are connected with different components of the surface deformation Δd and relief formation up to the giant, Δd/d >10% changes in the best As_0.2Se_0.8 or As₂S₃ compositions. Correlation is found between light and e-beam induced surface deformations during recording in similar compositions. Applications for prototyping phase-modulated optoelectronic elements are considered.

Citation Download Citation

M. Trunov, P. Lytvyn, P. M. Nagy, Cs. Cserhati, I. Charnovich, and S. Kokenyesi "Direct surface relief formation in As-S(Se) layers", Proc. SPIE 7598, Optical Components and Materials VII, 75981H (25 February 2010); https://doi.org/10.1117/12.837604

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