Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm

Hidekazu Mimura; Shinya Morita; Takashi Kimura; Daisuke Yamakawa; Weimin Lin; Yoshihiro Uehara; Hirokatsu Yumoto; Satoshi Matsuyama; Yoshinori Nishino; Kenji Tamasaku; Haruhiko Ohashi; Makina Yabashi; Tetsuya Ishikawa; Hitoshi Ohmori; Kazuto Yamauchi

doi:10.1117/12.795643

3 September 2008 Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm

Hidekazu Mimura, Shinya Morita, Takashi Kimura, Daisuke Yamakawa, Weimin Lin, Yoshihiro Uehara, Hirokatsu Yumoto, Satoshi Matsuyama, Yoshinori Nishino, Kenji Tamasaku, Haruhiko Ohashi, Makina Yabashi, Tetsuya Ishikawa, Hitoshi Ohmori, Kazuto Yamauchi

Author Affiliations +

Proceedings Volume 7077, Advances in X-Ray/EUV Optics and Components III; 70770R (2008) https://doi.org/10.1117/12.795643
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

We describe the fabrication of a long mirror for focusing X-ray free electron lasers to nanometer dimension, for the production of high photon density beams. The focusing mirror has an elliptical curved shape with a length of 400 mm and focal length of 550 mm. Electrolytic in-process dressing grinding is used for first-step figuring and elastic emission machining is employed for final figuring and surface smoothing. Figure accuracy with a peak-to-valley height of 2 nm is achieved. A focusing test was performed at BL29XUL of SPring-8 and found the focused beam size to be approximately 75 nm at 15 keV, very similar to the theoretical value.

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Hidekazu Mimura, Shinya Morita, Takashi Kimura, Daisuke Yamakawa, Weimin Lin, Yoshihiro Uehara, Hirokatsu Yumoto, Satoshi Matsuyama, Yoshinori Nishino, Kenji Tamasaku, Haruhiko Ohashi, Makina Yabashi, Tetsuya Ishikawa, Hitoshi Ohmori, and Kazuto Yamauchi "Fabrication of a 400-mm-long mirror for focusing x-ray free-electron lasers to sub-100 nm", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 70770R (3 September 2008); https://doi.org/10.1117/12.795643

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