Paper
15 January 2007 Growth of laser damage on the input surface of SiO2 at 351 nm
Mary A. Norton, Eugene E. Donohue, Michael D. Feit, Richard P. Hackel, William G. Hollingsworth, Alexander M. Rubenchik, Mary L. Spaeth
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Abstract
Growth of laser initiated damage is a potential lifetime limiter of laser optics. While laser initiated damage occurs most often on the exit surface of optical components, some damage sites can occur on the input surface. We have investigated the growth of laser initiated damage in fused silica when the damage occurs on the input surface of the optic. We have measured both the threshold for growth as well as the lateral growth rate at 351 nm. The lateral growth of damage on the input surface is best described as having a linear dependence on shot number. The rate of growth has a linear dependence on fluence, with an extrapolated threshold of approximately 6 J/cm2. This behavior will be contrasted to growth of damage when located on the exit surface. The behavior will be compared to growth of input surface damage when the irradiation wavelength is 1053 nm or 527 nm.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mary A. Norton, Eugene E. Donohue, Michael D. Feit, Richard P. Hackel, William G. Hollingsworth, Alexander M. Rubenchik, and Mary L. Spaeth "Growth of laser damage on the input surface of SiO2 at 351 nm", Proc. SPIE 6403, Laser-Induced Damage in Optical Materials: 2006, 64030L (15 January 2007); https://doi.org/10.1117/12.696085
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Cited by 33 scholarly publications.
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KEYWORDS
Laser induced damage

Silica

Laser systems engineering

Microscopes

Plasma

Laser optics

Photomicroscopy

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