Development of dioptric projection lenses for DUV lithography

Wilhelm Ulrich; Hans-Juergen Rostalski; Russell M. Hudyma

doi:10.1117/12.486477

23 December 2002 The development of dioptric projection lenses for DUV lithography

Wilhelm Ulrich, Hans-Juergen Rostalski, Russell M. Hudyma

Proceedings Volume 4832, International Optical Design Conference 2002; (2002) https://doi.org/10.1117/12.486477
Event: International Optical Design Conference 2002, 2002, Tucson, AZ, United States

Abstract

Advanced dioptric projection lenses from Carl Zeiss are used in some of the world's most advanced deep ultraviolet projection lithography systems. These lenses provide a resolution of better than 100 nm across the entire field of view with a level of aberration control that maximizes critical dimension uniformity and lithographic process latitude. These dioptric projection lenses are currently being used for critical layer device patterning for a wide array of complex logic, memory, and application specific integrated circuits. Zeiss' involvement in the develop of ultraviolet lenses goes back to the year 1902, exactly 100 years ago, when Moritz von Rohr calculated the first monochromatic ultraviolet micro-objectives for ultra-high resolution microphotography using a line-narrowed source. The modern dioptric projection lenses for lithography are influenced by the collective experience in the field of microscopy, and the more recent experience with early step-and-repeat lenses. This paper discusses some of the foundations of modern dioptric designs in the context of this history, demonstrating that rapid synthesis of designs is possbile using combinations of monochromatic microscope objectives and early step-and-repeat lenses from the 1970's. The problems associated with ultra high numerical aperture objectives are discussed. Specifically, it is demonstrated that aspheres can be used effective to reduce the volume of full field projection lenses, making the mechanical implementation of a 0.90 NA lens feasible in production. Several contemporary dioptric projection lens designs are reviewed in detail. The extension of these designs to numerical apertures greater than 1.0 using immersion techniques is demonstrated. These immersion lenses give the potential for 40 nm resolution.

Citation Download Citation

Wilhelm Ulrich, Hans-Juergen Rostalski, and Russell M. Hudyma "The development of dioptric projection lenses for DUV lithography", Proc. SPIE 4832, International Optical Design Conference 2002, (23 December 2002); https://doi.org/10.1117/12.486477

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available