Advanced deflector elements for high-throughput electron optical systems

Oliver Kienzle; Rainer Knippelmeyer; Wilfried Claus; Marko Matijevic; Lars Ehrhardt; Wolf D. Rau; Alexander Orchowski

doi:10.1117/12.472332

1 July 2002 Advanced deflector elements for high-throughput electron optical systems

Oliver Kienzle, Rainer Knippelmeyer, Wilfried Claus, Marko Matijevic, Lars Ehrhardt, Wolf D. Rau, Alexander Orchowski

Proceedings Volume 4688, Emerging Lithographic Technologies VI; (2002) https://doi.org/10.1117/12.472332
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We have successfully produced and outfitted in-lens deflector elements which can be used for off-axis aberration correction in high throughput electron optics. A thorough analysis of mechanical tolerances, the study of the effect of mechanical tolerances on the imaging performance, and the comparison of calculated and measured deflection fields indicate the capability of such deflector elements for reaching the demands of high throughput electron optical devices.

Citation Download Citation

Oliver Kienzle, Rainer Knippelmeyer, Wilfried Claus, Marko Matijevic, Lars Ehrhardt, Wolf D. Rau, and Alexander Orchowski "Advanced deflector elements for high-throughput electron optical systems", Proc. SPIE 4688, Emerging Lithographic Technologies VI, (1 July 2002); https://doi.org/10.1117/12.472332

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