Paper
20 September 2002 Polar-coordinate laser writer: analysis of exposure dose distribution
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Abstract
In the single point laser direct writing (LDW) process, there are differences between the exposure dose distribution and the light intensity distribution, and the differences will bring the line profile errors. In this paper, the equations to calculate the exposure dose distribution for the polar coordinate laser direct writing system are presented. The differences between the exposure dose distribution and the light intensity distribution are discussed. The line profile in the photoresist after development is predicted. The experimental results agree well with the theoretical forecast.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongjun Xie, Zhenwu Lu, Fengyou Li, and Zhicheng Weng "Polar-coordinate laser writer: analysis of exposure dose distribution", Proc. SPIE 4927, Optical Design and Testing, (20 September 2002); https://doi.org/10.1117/12.464067
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KEYWORDS
Photoresist materials

Laser systems engineering

Photoresist developing

Error analysis

Lithography

Atomic force microscopy

Diffractive optical elements

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