Lens aberration control for fine patterning with PSM

Takehito Kudo; Shigeru Hirukawa; Toshiharu Nakashima; Koichi Matsumoto

doi:10.1117/12.435769

14 September 2001 Lens aberration control for fine patterning with PSM

Takehito Kudo, Shigeru Hirukawa, Toshiharu Nakashima, Koichi Matsumoto

Proceedings Volume 4346, Optical Microlithography XIV; (2001) https://doi.org/10.1117/12.435769
Event: 26th Annual International Symposium on Microlithography, 2001, Santa Clara, CA, United States

Abstract

The impact of lens aberration on linewidth control and pattern shift is investigated with aerial image simulation using Zernike sensitivity method through focus to secure sufficient depth-of-focus (DOF). We found 0 and even theta component has large amount of impact on linewidth control in defocused condition due to best focus shift. This phenomenon makes degradation of DOF performance. For actual phase shift mask (PSM) application, DOF performance is very important, so as to reduce the focus shift by lens aberration, and the lens is controlled with pre-correction of best focus deviation in the field. This method is effective to obtain large DOF with PSM.

Citation Download Citation

Takehito Kudo, Shigeru Hirukawa, Toshiharu Nakashima, and Koichi Matsumoto "Lens aberration control for fine patterning with PSM", Proc. SPIE 4346, Optical Microlithography XIV, (14 September 2001); https://doi.org/10.1117/12.435769

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