Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

Chris K. Van Peski; Zsolt Bor; Todd J. Embree; Richard G. Morton

doi:10.1117/12.425033

12 April 2001 Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses

Chris K. Van Peski, Zsolt Bor, Todd J. Embree, Richard G. Morton

Proceedings Volume 4347, Laser-Induced Damage in Optical Materials: 2000; (2001) https://doi.org/10.1117/12.425033
Event: Laser-Induced Damage in Optical Materials: 2000, 2000, Boulder, CO, United States

Abstract

Fused silica samples from six suppliers were irradiated with a range of fluences (0.004 mJ/cm² to 0.2 mJ/cm²) using an ArF 193-nm excimer laser. The test was performed in an effort to determine fluence level dependency of induced wavefront distortion and birefringence. Each sample was irradiated with four beams of different fluence levels for 22 billion pulses over a period of 133 days. Wavefront distortion in the irradiated areas was observed for all samples. The sign and magnitude of the distortion were dependent upon the fluence level and the particular sample under irradiation. Birefringence measurements were also made. The birefringence characteristic varied among the samples, possibly as a function of fluence level and material. FTIR spectrum measurements were made and were correlated with wavefront distortion measurements. A description of the test and measurements is presented along with data covering a pulse count of 22 billion pulses.

Citation Download Citation

Chris K. Van Peski, Zsolt Bor, Todd J. Embree, and Richard G. Morton "Behavior of fused silica irradiated by a low-level 193-nm excimer laser for tens of billions of pulses", Proc. SPIE 4347, Laser-Induced Damage in Optical Materials: 2000, (12 April 2001); https://doi.org/10.1117/12.425033

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