Paper
4 April 1997 Compact ArF excimer lasers specific to microlithography and surgery
Hitoshi Sekita, Jun-ichi Yano, Akifumi Tada, Masashi Tamegai, Kenichi Yoshida, Tadashi Kasamatsu, Shinji Ito, Takashi Saito, Yukio Ogura
Author Affiliations +
Abstract
High repetition rate operation technology and spectral narrowing technology with compact excimer lasers whose cross-sectional dimensions are around 120 by 120 mm. High repetition rate operation over 1.5 kHz and spectral narrowing to 1 pm are reported. These technologies are essential to promising applications of ArF excimer lasers. High resolution pattern of 0.16 micrometer line and space is demonstrated by an optical laser lithography with the compact ArF excimer laser. The smallest ArF excimer laser specific to the photo-chemical surgery of cornea is also presented.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hitoshi Sekita, Jun-ichi Yano, Akifumi Tada, Masashi Tamegai, Kenichi Yoshida, Tadashi Kasamatsu, Shinji Ito, Takashi Saito, and Yukio Ogura "Compact ArF excimer lasers specific to microlithography and surgery", Proc. SPIE 2987, Gas and Chemical Lasers and Applications II, (4 April 1997); https://doi.org/10.1117/12.271552
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Excimer lasers

Surgery

Laser therapeutics

Optical lithography

Solid state lasers

Chromium

Pulsed laser operation

Back to Top