Scanning laser pattern generator for microelectronics reticle exposure

A. Podmanitczky

doi:10.1117/12.2308828

23 July 1993 Scanning laser pattern generator for microelectronics reticle exposure

A. Podmanitczky

Proceedings Volume 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology; 1983BD (1993) https://doi.org/10.1117/12.2308828
Event: 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1993, Budapest, Hungary

Abstract

A double pulsed RUBY-laser is used both to generate and record bending waves in plates. One part of the laser pulse is focused on the back surface of a steel plate causing a nearly instantaneous surface evaporation. The rapid expansion of the vaporised material produces an effect similar to a blast. The other part of the laser pulse is used to record the out of plane deformation of the front surface of the plate at increasing times after the "impact". The heating of the spot of the plate will cause strains in the plate. Numerical calculations gives that these stresses will also cause deformation in a small area just around the heating point. The experiments are compared with the numerical results with good agreement. The bending wave pattern outside a small area around the excitation point is found to be similar to that predicted by the Kirchhoff's plate equation with the starting conditions modelled as a point impact of infinitesimally short duration, thus indicating that the "impact" may be considered as a Dirac pulse in space an time.

Citation Download Citation

A. Podmanitczky "Scanning laser pattern generator for microelectronics reticle exposure", Proc. SPIE 1983, 16th Congress of the International Commission for Optics: Optics as a Key to High Technology, 1983BD (23 July 1993); https://doi.org/10.1117/12.2308828

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