Characterization of 5-X stepper lenses to improve depth of focus

David P. Paul; Maurice A. Hamel; Ken A. Lavallee

doi:10.1117/12.209293

26 May 1995 Characterization of 5X stepper lenses to improve depth of focus

David P. Paul, Maurice A. Hamel, Ken A. Lavallee

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209293
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

In the fabrication of integrated circuits, device pattern size determines electrical performance characteristics. Variations in the size of lines, trenches, contacts, straps, etc. result in electrical device performance differences. When the variations occur from chip to chip or wafer to wafer, we find that entire chips function differently (e.g. impacts clock speeds). This paper discusses within-chip variations that can produce undesirable effects which, when severe enough, can kill an entire chip because portions of it have incompatible electrical performance. The modeling and characterization of image-size variations caused by lens aberrations of 5X photolithography steppers with lens field sizes from 15 mm² to 22 mm² are also discussed.

Citation Download Citation

David P. Paul, Maurice A. Hamel, and Ken A. Lavallee "Characterization of 5X stepper lenses to improve depth of focus", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209293

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