Photosensitivity in optical fiber and silica-on-substrate waveguides

Bernard Malo; Francois Bilodeau; Jacques Albert; Derwyn C. Johnson; Kenneth O. Hill; Yoshinori Hibino; Makoto Abe

doi:10.1117/12.165674

22 December 1993 Photosensitivity in optical fiber and silica-on-substrate waveguides

Bernard Malo, Francois Bilodeau, Jacques Albert, Derwyn C. Johnson, Kenneth O. Hill, Yoshinori Hibino, Makoto Abe

Proceedings Volume 2044, Photosensitivity and Self-Organization in Optical Fibers and Waveguides; (1993) https://doi.org/10.1117/12.165674
Event: Optics Quebec, 1993, Quebec City, Canada

Abstract

Ultraviolet light irradiation of optical fibers or silica-on-silica channel optical waveguides photoinduces a permanent refractive index change in the core of the optical waveguide. The effect called `photosensitivity' provides a versatile photolithographic means for processing glass in the form of optical fiber or planar optical waveguides in order to fabricate optical waveguide devices that have applications in optical fiber communications and optical sensor systems. This paper reports on some recent experimental results on photosensitivity in optical fibers and planar optical waveguides and its use in the fabrication of optical waveguide devices.

Citation Download Citation

Bernard Malo, Francois Bilodeau, Jacques Albert, Derwyn C. Johnson, Kenneth O. Hill, Yoshinori Hibino, and Makoto Abe "Photosensitivity in optical fiber and silica-on-substrate waveguides", Proc. SPIE 2044, Photosensitivity and Self-Organization in Optical Fibers and Waveguides, (22 December 1993); https://doi.org/10.1117/12.165674

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