1 January 2005 Design and implementation of a vacuum-compatible laser-based subnanometer-resolution absolute distance measurement system
Patrick P. Naulleau, Paul E. Denham, Senajith Rekawa
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Abstract
We describe the design and implementation of a vacuum compatible laser-based absolute distance measurement system with subnanometer resolution. The presented system is compatible with operation in the 10–8-Torr range, and with some minor modifications it could be used in the 10–9-Torr range. The system is based on glancing incidence reflection and dual segmented diode detection. The system has been implemented as a focus sensor for extreme ultraviolet interferometry and microlithography experiments at Lawrence Berkeley National Laboratory's Advanced Light Source synchrotron radiation facility. A 3σ operational noise floor of 0.78 nm has been demonstrated.
©(2005) Society of Photo-Optical Instrumentation Engineers (SPIE)
Patrick P. Naulleau, Paul E. Denham, and Senajith Rekawa "Design and implementation of a vacuum-compatible laser-based subnanometer-resolution absolute distance measurement system," Optical Engineering 44(1), 013605 (1 January 2005). https://doi.org/10.1117/1.1830043
Published: 1 January 2005
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CITATIONS
Cited by 4 scholarly publications.
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KEYWORDS
Sensors

Diodes

Semiconducting wafers

Distance measurement

Image segmentation

Lithography

Computer aided design

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