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23 August 2021 Multi-beam mask writer, MBM-2000
Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, Noriaki Nakayamada
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Proceedings Volume 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology; 119080L (2021) https://doi.org/10.1117/12.2604378
Event: Photomask Japan 2021, 2021, Online Only
Abstract
A multi-beam mask writer, MBM-2000 is developed for the N3 semiconductor production. It is designed to accomplish high throughput with 16-nm beam and large current density 2.5 A/cm2. It is equipped with curve data format MBF2.0 to allow writing of small curve patterns in EUV masks and curvilinear OPC patterns in optical masks. To improve patterning resolution, pixel-level dose correction (PLDC) is implemented which corrects and enhances profile of dose deposited in resist. Writing tests have proven the global position accuracy that meets MBM-2000’s specification and the effectiveness of fidelity improvement function of PLDC.
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Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, and Noriaki Nakayamada "Multi-beam mask writer, MBM-2000", Proc. SPIE 11908, Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology, 119080L (23 August 2021); https://doi.org/10.1117/12.2604378
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KEYWORDS
Photomasks
Modulation
Thermal effects
Vestigial sideband modulation
Extreme ultraviolet lithography
Forward error correction
Error analysis
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