The capabilities of charged particle nanopatterning (CHARPAN) for photonic device fabrication are investigated. The CHARPAN tool is a proof-of-concept tool for a multi-ion beam system that the authors used to directly pattern photonic structures into both Si and Ni as well as for maskless exposure of hydrogen silsesquioxane resist. The realized structures have a regular array and show adequate roundness of the holes as well as little sidewall roughness. For the development and a better understanding of the processes they extended and used the IonShaper® simulation software. They could achieve excellent agreement between sputtering simulation and experiments. Furthermore, they developed a nonlocal recoil-based algorithm for the simulation of ion beam induced etching and deposition. Simulation results for three dimensional nanopatterning with this algorithm are presented.
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November 2009
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
December 02 2009
Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition
Christoph Ebm;
Christoph Ebm
a)
IMS Nanofabrication AG
, Schreygasse 3, 1020 Vienna, Austria
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Elmar Platzgummer;
Elmar Platzgummer
IMS Nanofabrication AG
, Schreygasse 3, 1020 Vienna, Austria
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Hans Loeschner;
Hans Loeschner
IMS Nanofabrication AG
, Schreygasse 3, 1020 Vienna, Austria
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Stefan Eder-Kapl;
Stefan Eder-Kapl
IMS Nanofabrication AG
, Schreygasse 3, 1020 Vienna, Austria
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Peter Joechl;
Peter Joechl
IMS Nanofabrication AG
, Schreygasse 3, 1020 Vienna, Austria
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Marco Kuemmel;
Marco Kuemmel
IMS Nanofabrication AG
, Schreygasse 3, 1020 Vienna, Austria
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Ruediger Reitinger;
Ruediger Reitinger
IMS Nanofabrication AG
, Schreygasse 3, 1020 Vienna, Austria
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Gerhard Hobler;
Gerhard Hobler
Institute of Solid State Electronics,
Vienna University of Technology
, Floragasse 7, 1040 Vienna, Austria
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Anton Koeck;
Anton Koeck
Austrian Research Centers GmbH
, Nano-System-Technologies, Donau-City-Strasse 1, 1220 Vienna, Austria
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Rainer Hainberger;
Rainer Hainberger
Austrian Research Centers GmbH
, Nano-System-Technologies, Donau-City-Strasse 1, 1220 Vienna, Austria
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Markus Wellenzohn;
Markus Wellenzohn
Austrian Research Centers GmbH
, Nano-System-Technologies, Donau-City-Strasse 1, 1220 Vienna, Austria
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Florian Letzkus;
Florian Letzkus
Institute for Microelectronics Stuttgart
, Allmandring 30a, 70569 Stuttgart, Germany
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Mathias Irmscher
Mathias Irmscher
Institute for Microelectronics Stuttgart
, Allmandring 30a, 70569 Stuttgart, Germany
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a)
Electronic mail: christoph.ebm@ims.co.at
J. Vac. Sci. Technol. B 27, 2668–2673 (2009)
Article history
Received:
July 09 2009
Accepted:
September 08 2009
Citation
Christoph Ebm, Elmar Platzgummer, Hans Loeschner, Stefan Eder-Kapl, Peter Joechl, Marco Kuemmel, Ruediger Reitinger, Gerhard Hobler, Anton Koeck, Rainer Hainberger, Markus Wellenzohn, Florian Letzkus, Mathias Irmscher; Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition. J. Vac. Sci. Technol. B 1 November 2009; 27 (6): 2668–2673. https://doi.org/10.1116/1.3242693
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